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Habilitation Thesis
DOI
https://doi.org/10.11606/T.3.2002.tde-24052022-085830
Document
Author
Full name
Antonio Carlos Seabra
E-mail
Institute/School/College
Knowledge Area
Date of Defense
Published
São Paulo, 2002
Committee
Noije, Wilhelmus Adrianus Maria Van (President)
Cescato, Lucila Helena Deliesposte
Galvao, Ricardo Magnus Osorio
Maciel, Homero Santiago
Pereyra, Ines
Title in Portuguese
Técnicas litográficas não convencionais para fabricação de microdispositivos
Keywords in Portuguese
Dispositivos ópticos
Feixes ópticos
Litografia
Microeletrônica
Abstract in Portuguese
Neste trabalho estabelecemos um sistema de litografia por feixe de elétrons voltado à pesquisa, especialmente para fabricação de microdispositivos eletromecânicos e ópticos e descrevemos algumas aplicações desse sistema. Inicialmente descreve-se o sistema litográfico estabelecido, suas principais características, equipamentos e ferramentas de software agregadas. A seguir descreve-se o desenvolvimento de processos litográficos empregando-se resistes espessos, procurando-se enfatizar os aspectos distintos da litografia tradicional para CIs. Também é dada especial atenção à modelagem de perfis de relevo contínuo para fabricação de microdispositivos ópticos. Como exemplos práticos da aplicação desse sistema são mostrados os resultados obtidos na fabricação de microengrenagens, microosciladores fluídicos e microlentes de relevo contínuo.
Title in English
Non-conventional litographic techniques for the fabrication of microdevices.
Keywords in English
Lithography
Microelectronics
Optical beams
Optical devices
Abstract in English
In this work it is presented an e-beam direct write lithographic system dedicated to research and especially designed for microelectromechanical and micro optical devices together with some of its possible applications. These system, its characteristics, modules and software tools are first described. Then some of the lithographic processes developed for thick resist applications are detailed, giving special attention to aspects that are considerably different from tradition IC lithography. Modeling and simulation of continuous relief profiles for micro optical applications are also emphasized. Finally, practical examples of application of this system are shown: fabrication of micro gears in resist, fabrication of micro fluidic oscillators, and fabrication of continuous relief micro lenses.
 
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Publishing Date
2022-05-24
 
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